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    Application of irradiation-then-nitridation to improve the radiation hardness in MOS gate dielectrics

    New search for: Lee, K.-C.
    New search for: Hwu, J.-G.

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    Application of irradiation-then-nitridation to improve the radiation hardness in MOS gate dielectrics

    New search for: Lee, K.-C.
    New search for: Hwu, J.-G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Application of irradiation-then-nitridation to improve the radiation hardness in MOS gate dielectrics

    New search for: Lee, K.-C.
    New search for: Hwu, J.-G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    Application of irradiation-then-nitridation to improve the radiation hardness in MOS gate dielectrics

    Contributors:

    Lee, K.-C. (author) / Hwu, J.-G. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 92 ; 204-207

    Publication date:

    1996-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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