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    Effects of N2 and NH3 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics

    New search for: Park, K. S.
    New search for: Baek, K. H.
    New search for: Kim, D. P.
    New search for: Woo, J. C.
    New search for: Do, L. M.
    New search for: No, K. S.

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    Effects of N2 and NH3 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics

    New search for: Park, K. S.
    New search for: Baek, K. H.
    New search for: Kim, D. P.
    New search for: Woo, J. C.
    New search for: Do, L. M.
    New search for: No, K. S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effects of N2 and NH3 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics

    New search for: Park, K. S.
    New search for: Baek, K. H.
    New search for: Kim, D. P.
    New search for: Woo, J. C.
    New search for: Do, L. M.
    New search for: No, K. S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Effects of N2 and NH3 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics

    Contributors:

    Park, K. S. (author) / Baek, K. H. (author) / Kim, D. P. (author) / Woo, J. C. (author) / Do, L. M. (author) / No, K. S. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 257 ; 1347-1350

    Publication date:

    2010-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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