Investigation of the surface of P-implanted LPCVD silicon films

Plugaru, R. / Vasile, E. / Cobianu, C. et al. | British Library Online Contents | 1996

Chemical Composition of Silicon Nitride Thin Films Prepared by LPCVD

Ge, Q.-m. / Liu, X.-j. / Huang, Z.-y. et al. | British Library Online Contents | 2006

Chemical vapor deposition of hexagonal boron nitride films in the reduced pressure

Choi, B. j. | British Library Online Contents | 1999

Low pressure chemical vapor deposition (LPCVD) of -SiC on Si(100) using MTS in a hot wall reactor

Chiu, C. C. / Desu, S. B. / Ching Yi Tsai | British Library Online Contents | 1993

Effect of Gas Pressure on the Boron-Doped Hydrogenated Amorphous Carbon Thin Films Grown by Radio Frequency Plasma-Enhanced Chemical Vapor Deposition

Rusop, M. / Abdullah, S. / Podder, J. et al. | British Library Online Contents | 2006