Stress relief patterns of hydrogenated amorphous carbon films grown by dc-pulse plasma chemical vapor deposition

Wang, Q. / Wang, C. / Wang, Z. et al. | British Library Online Contents | 2008

Effect of deposition pressure on bonding nature in hydrogenated amorphous carbon films processed by electron cyclotron resonance plasma enhanced chemical vapor deposition

Ryu, H.J. / Kim, S.H. / Hong, S.H. | British Library Online Contents | 2000

Plasma Enhanced Chemical Vapor Deposition and Characterization of Hydrogenated Amorphous SiC Films on Si

Wang, Y. / Lin, J. / Feng, Z. C. et al. | British Library Online Contents | 2000

Crystallization kinetics of hydrogenated amorphous silicon thick films grown by plasma-enhanced chemical vapour deposition

Farjas, J. / Rath, C. / Roura, P. et al. | British Library Online Contents | 2004

Enhanced field emission characteristics of boron doped diamond films grown by microwave plasma assisted chemical vapor deposition

Koinkar, P. M. / Patil, S. S. / Kim, T. G. et al. | British Library Online Contents | 2011