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Reliability study of sub-micron titanium silicide contacts

Lin, C. C. / Chen, W. S. / Hwang, H. L. / Hsu, K. Y. J. / Liou, H. K. / Tu, K. N.

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Reliability study of sub-micron titanium silicide contacts

Lin, C. C. / Chen, W. S. / Hwang, H. L. / Hsu, K. Y. J. / Liou, H. K. / Tu, K. N.

Reliability study of sub-micron titanium silicide contacts

Lin, C. C. / Chen, W. S. / Hwang, H. L. / Hsu, K. Y. J. / Liou, H. K. / Tu, K. N.

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Document information

Title:

Reliability study of sub-micron titanium silicide contacts

Contributors:

Lin, C. C. (author) / Chen, W. S. (author) / Hwang, H. L. (author) / Hsu, K. Y. J. (author) / Liou, H. K. (author) / Tu, K. N. (author)

Published in:

APPLIED SURFACE SCIENCE ; 92 ; 660-664

Publication date:

1996-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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