A platform for research: civil engineering, architecture and urbanism
Mechanisms for Enhanced Formation of the C45 Phase of Titanium Silicide Ultra-Large-Scale Integration Contacts
Mechanisms for Enhanced Formation of the C45 Phase of Titanium Silicide Ultra-Large-Scale Integration Contacts
Mechanisms for Enhanced Formation of the C45 Phase of Titanium Silicide Ultra-Large-Scale Integration Contacts
Harper, J. M. E. (author) / Cabral, C. (author) / Lavoie, C. (author)
ANNUAL REVIEW OF MATERIALS SCIENCE ; 30 ; 523-543
2000-01-01
21 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Reliability study of sub-micron titanium silicide contacts
British Library Online Contents | 1996
|Formation of contacts to shallow junctions using titanium silicide with diffusion barriers
British Library Online Contents | 1998
|Silicide formation in contacts to Si nanowires
British Library Online Contents | 2012
|Characterization of sputtered titanium silicide ohmic contacts on n-type 6H-silicon carbide
British Library Online Contents | 1999
|Formation mechanism of titanium silicide by mechanical alloying
British Library Online Contents | 2001
|