Structural and residual stress changes in Mo/a-Si multilayer thin films with annealing: Fid-Bau Portal

Structural and residual stress changes in Mo/a-Si multilayer thin films with annealing

Kassner, M. E. / Weber, F. J. / Koike, J. / Rosen, R. S.

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Structural and residual stress changes in Mo/a-Si multilayer thin films with annealing

Kassner, M. E. / Weber, F. J. / Koike, J. / Rosen, R. S.

Structural and residual stress changes in Mo/a-Si multilayer thin films with annealing

Kassner, M. E. / Weber, F. J. / Koike, J. / Rosen, R. S.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Structural and residual stress changes in Mo/a-Si multilayer thin films with annealing

Contributors:

Kassner, M. E. (author) / Weber, F. J. (author) / Koike, J. (author) / Rosen, R. S. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE ; 31 ; 2291-2299

Publication date:

1996-01-01

Size:

9 pages

ISSN:

0022-2461

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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