UHV-CVD Ge/Si(100)heteroepitaxy monitored by in situ ellipsometry: Fid-Bau Portal

UHV-CVD Ge/Si(100)heteroepitaxy monitored by in situ ellipsometry

Larciprete, R. / Cozzi, S. / Masetti, E. / Montecchi, M.

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UHV-CVD Ge/Si(100)heteroepitaxy monitored by in situ ellipsometry

Larciprete, R. / Cozzi, S. / Masetti, E. / Montecchi, M.

UHV-CVD Ge/Si(100)heteroepitaxy monitored by in situ ellipsometry

Larciprete, R. / Cozzi, S. / Masetti, E. / Montecchi, M.

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Document information

Title:

UHV-CVD Ge/Si(100)heteroepitaxy monitored by in situ ellipsometry

Contributors:

Larciprete, R. (author) / Cozzi, S. (author) / Masetti, E. (author) / Montecchi, M. (author)

Published in:

APPLIED SURFACE SCIENCE ; 102 ; 52-56

Publication date:

1996-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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