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Monitoring of atomic layer deposition by incremental dielectric reflection

Rosental, A. / Adamson, P. / Gerst, A. / Niilisk, A.

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Monitoring of atomic layer deposition by incremental dielectric reflection

Rosental, A. / Adamson, P. / Gerst, A. / Niilisk, A.

Monitoring of atomic layer deposition by incremental dielectric reflection

Rosental, A. / Adamson, P. / Gerst, A. / Niilisk, A.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Monitoring of atomic layer deposition by incremental dielectric reflection

Contributors:

Rosental, A. (author) / Adamson, P. (author) / Gerst, A. (author) / Niilisk, A. (author)

Published in:

APPLIED SURFACE SCIENCE ; 107 ; 178-183

Publication date:

1996-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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