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Monitoring of atomic layer deposition by incremental dielectric reflection
Monitoring of atomic layer deposition by incremental dielectric reflection
Monitoring of atomic layer deposition by incremental dielectric reflection
Rosental, A. (Autor:in) / Adamson, P. (Autor:in) / Gerst, A. (Autor:in) / Niilisk, A. (Autor:in)
APPLIED SURFACE SCIENCE ; 107 ; 178-183
01.01.1996
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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