Chemicodynamic Etching Method for Making Angle Laps in Semiconductor Wafers: Fid-Bau Portal

Chemicodynamic Etching Method for Making Angle Laps in Semiconductor Wafers

Perevoshchikov, V. A. / Skupov, V. D. / Shengurov, V. G.

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Chemicodynamic Etching Method for Making Angle Laps in Semiconductor Wafers

Perevoshchikov, V. A. / Skupov, V. D. / Shengurov, V. G.

Chemicodynamic Etching Method for Making Angle Laps in Semiconductor Wafers

Perevoshchikov, V. A. / Skupov, V. D. / Shengurov, V. G.

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Check availability in my library

Order at Subito €

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Document information

Title:

Chemicodynamic Etching Method for Making Angle Laps in Semiconductor Wafers

Contributors:

Perevoshchikov, V. A. (author) / Skupov, V. D. (author) / Shengurov, V. G. (author)

Published in:

INDUSTRIAL LABORATORY C/C OF ZAVODSKAIA LABORATORIIA ; 62 ; 508-510

Publication date:

1996-01-01

Size:

3 pages

ISSN:

0019-8447

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 607.2

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