Micro-Raman study of thermoelastic stress distribution in oxidized silicon membranes and correlation with finite element modeling: Fid-Bau Portal

Micro-Raman study of thermoelastic stress distribution in oxidized silicon membranes and correlation with finite element modeling

Guyot, Y. / Malhaire, C. / Le Berre, M. / Champagnon, B. / Sibai, A. / Bustarret, E. / Barbier, D.

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Micro-Raman study of thermoelastic stress distribution in oxidized silicon membranes and correlation with finite element modeling

Guyot, Y. / Malhaire, C. / Le Berre, M. / Champagnon, B. / Sibai, A. / Bustarret, E. / Barbier, D.

Micro-Raman study of thermoelastic stress distribution in oxidized silicon membranes and correlation with finite element modeling

Guyot, Y. / Malhaire, C. / Le Berre, M. / Champagnon, B. / Sibai, A. / Bustarret, E. / Barbier, D.

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Title:

Micro-Raman study of thermoelastic stress distribution in oxidized silicon membranes and correlation with finite element modeling

Contributors:

Guyot, Y. (author) / Malhaire, C. (author) / Le Berre, M. (author) / Champagnon, B. (author) / Sibai, A. (author) / Bustarret, E. (author) / Barbier, D. (author) / Camassel, J. / Fricke, K. / Krozer, V.

Published in:

High Temperature Electronics: Materials, Devices and Applications ; 24-28

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 46

Publication date:

1997-01-01

Size:

5 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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