Atomistic modeling of chemical vapor deposition: silicon nitride CVD from dichlorosilane and ammonia

Bagatur`yants, A. A. / Novoselov, K. P. / Safonov, A. A. et al. | British Library Online Contents | 2000

Epitaxial nucleation of polycrystalline silicon carbide during chemical vapor deposition

Sheldon, B. W. / Besmann, T. M. / More, K. L. et al. | British Library Online Contents | 1993

Chemical and structural properties of polymorphous silicon thin films grown from dichlorosilane

Alvarez-Macias, C. / Monroy, B. M. / Huerta, L. et al. | British Library Online Contents | 2013

Modeling analysis of gas phase nucleation in silicon carbide chemical vapor deposition

Vorob'ev, A.N. / Komissarov, A.E. / Segal, A.S. et al. | British Library Online Contents | 1999

Point defect incorporation during diamond chemical vapor deposition

Battaile, C. C. / Srolovitz, D. J. / Butler, J. E. | British Library Online Contents | 1999