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Properties of silicon doped silicon dioxide thin films deposited by Co-sputtering of silicon and silicon dioxide

Sandhu, A. / Show, Y. / Katano, T. / Iwase, M. / Izumi, T. / Yabe, T. / Nozaki, S. / Morisaki, H.

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Properties of silicon doped silicon dioxide thin films deposited by Co-sputtering of silicon and silicon dioxide

Sandhu, A. / Show, Y. / Katano, T. / Iwase, M. / Izumi, T. / Yabe, T. / Nozaki, S. / Morisaki, H.

Properties of silicon doped silicon dioxide thin films deposited by Co-sputtering of silicon and silicon dioxide

Sandhu, A. / Show, Y. / Katano, T. / Iwase, M. / Izumi, T. / Yabe, T. / Nozaki, S. / Morisaki, H.

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Document information

Title:

Properties of silicon doped silicon dioxide thin films deposited by Co-sputtering of silicon and silicon dioxide

Contributors:

Sandhu, A. (author) / Show, Y. (author) / Katano, T. (author) / Iwase, M. (author) / Izumi, T. (author) / Yabe, T. (author) / Nozaki, S. (author) / Morisaki, H. (author)

Published in:

APPLIED SURFACE SCIENCE ; 117/118 ; 634-637

Publication date:

1997-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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