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    Plasma Enhanced Chemical Vapor Deposited Silicon and Silicon Dioxide Films for Indium Phosphide MISFET Technology

    New search for: Shokrani, M.
    New search for: Kapoor, V. J.

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    Plasma Enhanced Chemical Vapor Deposited Silicon and Silicon Dioxide Films for Indium Phosphide MISFET Technology

    New search for: Shokrani, M.
    New search for: Kapoor, V. J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Plasma Enhanced Chemical Vapor Deposited Silicon and Silicon Dioxide Films for Indium Phosphide MISFET Technology

    New search for: Shokrani, M.
    New search for: Kapoor, V. J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    Plasma Enhanced Chemical Vapor Deposited Silicon and Silicon Dioxide Films for Indium Phosphide MISFET Technology

    Contributors:

    Shokrani, M. (author) / Kapoor, V. J. (author)

    Published in:

    MATERIALS SCIENCE FORUM ; 285

    Publication date:

    1993-01-01

    Size:

    285 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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