Formation Kinetics of the Al-Related Shallow Thermal Donors: A Probe for Oxygen Diffusion in Silicon: Fid-Bau Portal

Formation Kinetics of the Al-Related Shallow Thermal Donors: A Probe for Oxygen Diffusion in Silicon

Kaczor, P. / Dobaczewski, L. / Gregorkiewicz, T. / Ammerlaan, C. A. J.

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Formation Kinetics of the Al-Related Shallow Thermal Donors: A Probe for Oxygen Diffusion in Silicon

Kaczor, P. / Dobaczewski, L. / Gregorkiewicz, T. / Ammerlaan, C. A. J.

Formation Kinetics of the Al-Related Shallow Thermal Donors: A Probe for Oxygen Diffusion in Silicon

Kaczor, P. / Dobaczewski, L. / Gregorkiewicz, T. / Ammerlaan, C. A. J.

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Title:

Formation Kinetics of the Al-Related Shallow Thermal Donors: A Probe for Oxygen Diffusion in Silicon

Contributors:

Kaczor, P. (author) / Dobaczewski, L. (author) / Gregorkiewicz, T. (author) / Ammerlaan, C. A. J. (author) / Davies, G. / Nazare, M. H.

Published in:

Defects in Semiconductors: ICDS 19 ; 1761-1766

MATERIALS SCIENCE FORUM ; 258/263

Publication date:

1997-01-01

Size:

6 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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