Influence of sputtering atmosphere on crystallinity and crystal orientation of AIN thin films deposited on polycrystalline MoSi~2 substrates: Fid-Bau Portal

Influence of sputtering atmosphere on crystallinity and crystal orientation of AIN thin films deposited on polycrystalline MoSi~2 substrates

Akiyama, M. / Xu, C. / Nonaka, K. / Hagio, T. / Nishimura, S. / Shobu, K. / Watanabe, T.

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Influence of sputtering atmosphere on crystallinity and crystal orientation of AIN thin films deposited on polycrystalline MoSi~2 substrates

Akiyama, M. / Xu, C. / Nonaka, K. / Hagio, T. / Nishimura, S. / Shobu, K. / Watanabe, T.

Influence of sputtering atmosphere on crystallinity and crystal orientation of AIN thin films deposited on polycrystalline MoSi~2 substrates

Akiyama, M. / Xu, C. / Nonaka, K. / Hagio, T. / Nishimura, S. / Shobu, K. / Watanabe, T.

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Document information

Title:

Influence of sputtering atmosphere on crystallinity and crystal orientation of AIN thin films deposited on polycrystalline MoSi~2 substrates

Contributors:

Akiyama, M. (author) / Xu, C. (author) / Nonaka, K. (author) / Hagio, T. (author) / Nishimura, S. (author) / Shobu, K. (author) / Watanabe, T. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE ; 33 ; 2463-2467

Publication date:

1998-01-01

Size:

5 pages

ISSN:

0022-2461

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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