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    Atomic-layer chemical-vapor-deposition of silicon dioxide films with an extremely low hydrogen content

    New search for: Yamaguchi, K.-I.
    New search for: Imai, S.
    New search for: Ishitobi, N.
    New search for: Takemoto, M.
    New search for: Miki, H.
    New search for: Matsumura, M.

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    Atomic-layer chemical-vapor-deposition of silicon dioxide films with an extremely low hydrogen content

    New search for: Yamaguchi, K.-I.
    New search for: Imai, S.
    New search for: Ishitobi, N.
    New search for: Takemoto, M.
    New search for: Miki, H.
    New search for: Matsumura, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Atomic-layer chemical-vapor-deposition of silicon dioxide films with an extremely low hydrogen content

    New search for: Yamaguchi, K.-I.
    New search for: Imai, S.
    New search for: Ishitobi, N.
    New search for: Takemoto, M.
    New search for: Miki, H.
    New search for: Matsumura, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Atomic-layer chemical-vapor-deposition of silicon dioxide films with an extremely low hydrogen content

    Contributors:

    Yamaguchi, K.-I. (author) / Imai, S. (author) / Ishitobi, N. (author) / Takemoto, M. (author) / Miki, H. (author) / Matsumura, M. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 130-132 ; 202-207

    Publication date:

    1998-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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