A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
Selective atomic layer deposition of MoSix on Si (0 0 1) in preference to silicon nitride and silicon oxide
Selective atomic layer deposition of MoSix on Si (0 0 1) in preference to silicon nitride and silicon oxide
Selective atomic layer deposition of MoSix on Si (0 0 1) in preference to silicon nitride and silicon oxide
Choi, Jong Youn (author) / Ahles, Christopher F. (author) / Hung, Raymond (author) / Kim, Namsung (author) / Kummel, Andrew C. (author)
Applied surface science ; 462 ; 1008-1016
2018-01-01
9 pages
Article (Journal)
English
DDC:
620.44
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Atomic-layer chemical-vapor-deposition of silicon-nitride
| British Library Online Contents | 1997
Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
| British Library Online Contents | 1998
Hafnium silicon oxide films prepared by atomic layer deposition
| British Library Online Contents | 2004
Silicon Atomic Layer Deposition on Nanocrystalline Diamond
| British Library Online Contents | 2006
Low-pressure chemical vapour deposition growth of epitaxial silicon selective to silicon nitride
| British Library Online Contents | 2002