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    Correlation between Deposition Rate and Hardness of Remote PECVD Silicon Oxide Films

    New search for: Bayer, C.
    New search for: Rudolf von Rohr, P.

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    Correlation between Deposition Rate and Hardness of Remote PECVD Silicon Oxide Films

    New search for: Bayer, C.
    New search for: Rudolf von Rohr, P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Correlation between Deposition Rate and Hardness of Remote PECVD Silicon Oxide Films

    New search for: Bayer, C.
    New search for: Rudolf von Rohr, P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
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    Document information
    Title:

    Correlation between Deposition Rate and Hardness of Remote PECVD Silicon Oxide Films

    Contributors:

    Bayer, C. (author) / Rudolf von Rohr, P. (author)

    Published in:

    MATERIALS SCIENCE FORUM ; 287/288 ; 389-392

    Publication date:

    1998-01-01

    Size:

    4 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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