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    Evolution of the mechanical stress on PECVD silicon oxide films under thermal processing

    New search for: Rodriguez, J. A.
    New search for: Llobera, A.
    New search for: Dominguez, C.

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    Evolution of the mechanical stress on PECVD silicon oxide films under thermal processing

    New search for: Rodriguez, J. A.
    New search for: Llobera, A.
    New search for: Dominguez, C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Evolution of the mechanical stress on PECVD silicon oxide films under thermal processing

    New search for: Rodriguez, J. A.
    New search for: Llobera, A.
    New search for: Dominguez, C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Evolution of the mechanical stress on PECVD silicon oxide films under thermal processing

    Contributors:

    Rodriguez, J. A. (author) / Llobera, A. (author) / Dominguez, C. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE LETTERS ; 19 ; 1399-1402

    Publication date:

    2000-01-01

    Size:

    4 pages

    ISSN:

    0261-8028

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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