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TOF study of pulsed-laser ablation of aluminum nitride for thin film growth

Chu, C. / Ong, P. P. / Chen, H. F. / Teo, H. H.

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TOF study of pulsed-laser ablation of aluminum nitride for thin film growth

Chu, C. / Ong, P. P. / Chen, H. F. / Teo, H. H.

TOF study of pulsed-laser ablation of aluminum nitride for thin film growth

Chu, C. / Ong, P. P. / Chen, H. F. / Teo, H. H.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

TOF study of pulsed-laser ablation of aluminum nitride for thin film growth

Contributors:

Chu, C. (author) / Ong, P. P. (author) / Chen, H. F. (author) / Teo, H. H. (author)

Published in:

APPLIED SURFACE SCIENCE ; 137 ; 91-97

Publication date:

1999-01-01

Size:

7 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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