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Epitaxial growth of Si by low-energy DC-plasma chemical vapor deposition

Mateeva, E. / Deller, H. R. / Kafader, U. / Rosenblad, C. / Von Kaenel, H. / Dommann, A.

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Epitaxial growth of Si by low-energy DC-plasma chemical vapor deposition

Mateeva, E. / Deller, H. R. / Kafader, U. / Rosenblad, C. / Von Kaenel, H. / Dommann, A.

Epitaxial growth of Si by low-energy DC-plasma chemical vapor deposition

Mateeva, E. / Deller, H. R. / Kafader, U. / Rosenblad, C. / Von Kaenel, H. / Dommann, A.

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Document information

Title:

Epitaxial growth of Si by low-energy DC-plasma chemical vapor deposition

Contributors:

Mateeva, E. (author) / Deller, H. R. (author) / Kafader, U. (author) / Rosenblad, C. (author) / Von Kaenel, H. (author) / Dommann, A. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE LETTERS ; 17 ; 1545-1548

Publication date:

1998-01-01

Size:

4 pages

ISSN:

0261-8028

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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