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Modeling of the surface roughness of thin TiSi~2 films at the point of rupture

Amorsolo, A. V. / Funkenbusch, P. D. / Kadin, A. M.

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Modeling of the surface roughness of thin TiSi~2 films at the point of rupture

Amorsolo, A. V. / Funkenbusch, P. D. / Kadin, A. M.

Modeling of the surface roughness of thin TiSi~2 films at the point of rupture

Amorsolo, A. V. / Funkenbusch, P. D. / Kadin, A. M.

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Check availability in my library

Order at Subito €

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Document information

Title:

Modeling of the surface roughness of thin TiSi~2 films at the point of rupture

Contributors:

Amorsolo, A. V. (author) / Funkenbusch, P. D. (author) / Kadin, A. M. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 57 ; 186-196

Publication date:

1999-01-01

Size:

11 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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