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Ultra high temperature rapid thermal annealing of GaN

Cao, X. A. / Singh, R. K. / Pearton, S. J. / Fu, M. / Sekhar, J. A. / Wilson, R. G. / Zolper, J. C. / Han, J. / Rieger, D. J. / Shul, R. J.

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Ultra high temperature rapid thermal annealing of GaN

Cao, X. A. / Singh, R. K. / Pearton, S. J. / Fu, M. / Sekhar, J. A. / Wilson, R. G. / Zolper, J. C. / Han, J. / Rieger, D. J. / Shul, R. J.

Ultra high temperature rapid thermal annealing of GaN

Cao, X. A. / Singh, R. K. / Pearton, S. J. / Fu, M. / Sekhar, J. A. / Wilson, R. G. / Zolper, J. C. / Han, J. / Rieger, D. J. / Shul, R. J.

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Document information

Title:

Ultra high temperature rapid thermal annealing of GaN

Contributors:

Cao, X. A. (author) / Singh, R. K. (author) / Pearton, S. J. (author) / Fu, M. (author) / Sekhar, J. A. (author) / Wilson, R. G. (author) / Zolper, J. C. (author) / Han, J. (author) / Rieger, D. J. (author) / Shul, R. J. (author)

Published in:

Papers presented at the European Materials Research Society 1998 Meeting. Symposium I: Rapid Thermal Processing ; 267-270

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 1

Publication date:

1998-01-01

Size:

4 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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