Characterization of oxygen and nitrogen rapid thermal annealing processes for ultra-low-k SiCOH films: Fid-Bau Portal

Characterization of oxygen and nitrogen rapid thermal annealing processes for ultra-low-k SiCOH films

Lee, S. / Jung, D. / Yang, J. / Boo, J.-h. / Kim, H. / Lee, J. / Chae, H.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Characterization of oxygen and nitrogen rapid thermal annealing processes for ultra-low-k SiCOH films

Lee, S. / Jung, D. / Yang, J. / Boo, J.-h. / Kim, H. / Lee, J. / Chae, H.

Characterization of oxygen and nitrogen rapid thermal annealing processes for ultra-low-k SiCOH films

Lee, S. / Jung, D. / Yang, J. / Boo, J.-h. / Kim, H. / Lee, J. / Chae, H.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Document information

Title:

Characterization of oxygen and nitrogen rapid thermal annealing processes for ultra-low-k SiCOH films

Contributors:

Lee, S. (author) / Jung, D. (author) / Yang, J. (author) / Boo, J.-h. (author) / Kim, H. (author) / Lee, J. (author) / Chae, H. (author)

Published in:

JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 23 ; 856-861

Publication date:

2008-01-01

Size:

6 pages

ISSN:

0884-2914

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

Wang, L. / Ganor, M. / Rokhlin, S. I. et al. | British Library Online Contents | 2005

Ultra high temperature rapid thermal annealing of GaN

Cao, X. A. / Singh, R. K. / Pearton, S. J. et al. | British Library Online Contents | 1998

Rapid thermal annealing of ITO films

Song, S. / Yang, T. / Liu, J. et al. | British Library Online Contents | 2011

Defect annealing in ultra-thin polycrystalline silicon films on glass: Rapid thermal versus laser processing

Li, W. / Varlamov, S. / Dore, J. et al. | British Library Online Contents | 2013

Effects of He (90%)/H2 (10%) plasma treatment on electric properties of low dielectric constant SiCOH films

Kim, H. / Ha, M.H. / Jung, D. et al. | British Library Online Contents | 2012