Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Void nucleation in metal interconnects: Combined effects of interface flaws and crystallographic slip

    New search for: Shen, Y.-L.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Void nucleation in metal interconnects: Combined effects of interface flaws and crystallographic slip

    New search for: Shen, Y.-L.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Void nucleation in metal interconnects: Combined effects of interface flaws and crystallographic slip

    New search for: Shen, Y.-L.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Void nucleation in metal interconnects: Combined effects of interface flaws and crystallographic slip

    Contributors:

    Shen, Y.-L. (author)

    Published in:

    JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 14 ; 584-591

    Publication date:

    1999-01-01

    Size:

    8 pages

    ISSN:

    0884-2914

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Void nucleation in passivated interconnect lines: Effects of site geometries, interfaces, and interface flaws

    Gleixner, R. J. / Clemens, B. M. / Nix, W. D. | British Library Online Contents | 1997

    Modeling electromigration and the void nucleation in thin-film interconnects of integrated circuits

    Goldstein, R. V. / Sarychev, M. E. / Shirabaikin, D. B. et al. | British Library Online Contents | 2001

    Effects of void band orientation and crystallographic anisotropy on void growth and coalescence

    Nemcko, Michael J. / Li, Jing / Wilkinson, David S. | British Library Online Contents | 2016

    Effects of void band orientation and crystallographic anisotropy on void growth and coalescence

    Nemcko, Michael J. / Li, Jing / Wilkinson, David S. | British Library Online Contents | 2016

    Effects of void band orientation and crystallographic anisotropy on void growth and coalescence

    Nemcko, Michael J. / Li, Jing / Wilkinson, David S. | British Library Online Contents | 2016

    Back to top