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Chemical etching of thin SiO~xC~yH~z films by post-deposition exposure to oxygen plasma
Chemical etching of thin SiO~xC~yH~z films by post-deposition exposure to oxygen plasma
Chemical etching of thin SiO~xC~yH~z films by post-deposition exposure to oxygen plasma
Vallee, C. (author) / Granier, A. (author) / Aumaille, K. (author) / Cardinaud, C. (author) / Goullet, A. (author) / Coulon, N. (author) / Turban, G. (author) / Boyd, I. W. / Perriere, J. / Stuke, M.
1999-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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