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On the post-etching of diamond thin films in hydrogen-oxygen atmosphere
On the post-etching of diamond thin films in hydrogen-oxygen atmosphere
On the post-etching of diamond thin films in hydrogen-oxygen atmosphere
Xiling, P. (author) / Xiaolin, C. (author)
JOURNAL OF MATERIALS SCIENCE LETTERS ; 12 ; 687
1993-01-01
687 pages
Article (Journal)
Unknown
DDC:
620.11
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