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Polycrystalline silicon film formation at low temperature using ultra-high-frequency plasma enhanced chemical vapor deposition
Polycrystalline silicon film formation at low temperature using ultra-high-frequency plasma enhanced chemical vapor deposition
Polycrystalline silicon film formation at low temperature using ultra-high-frequency plasma enhanced chemical vapor deposition
Mebarki, B. (author) / Sumiya, S. (author) / Yoshida, R. (author) / Ito, M. (author) / Hori, M. (author) / Goto, T. (author) / Samukawa, S. (author) / Tsukada, T. (author)
MATERIALS LETTERS ; 41 ; 16-19
1999-01-01
4 pages
Article (Journal)
English
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