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    Nanocrystalline Silicon Films Grown at High Pressure in Very High Frequency Plasma Enhanced Chemical Vapor Deposition System

    New search for: Guo, Y.Q.
    New search for: Huang, R.
    New search for: Song, J.
    New search for: Wang, X.
    New search for: Zhang, Y.X.
    New search for: Huang, Y.M.

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    Nanocrystalline Silicon Films Grown at High Pressure in Very High Frequency Plasma Enhanced Chemical Vapor Deposition System

    New search for: Guo, Y.Q.
    New search for: Huang, R.
    New search for: Song, J.
    New search for: Wang, X.
    New search for: Zhang, Y.X.
    New search for: Huang, Y.M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Nanocrystalline Silicon Films Grown at High Pressure in Very High Frequency Plasma Enhanced Chemical Vapor Deposition System

    New search for: Guo, Y.Q.
    New search for: Huang, R.
    New search for: Song, J.
    New search for: Wang, X.
    New search for: Zhang, Y.X.
    New search for: Huang, Y.M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Nanocrystalline Silicon Films Grown at High Pressure in Very High Frequency Plasma Enhanced Chemical Vapor Deposition System

    Contributors:

    Guo, Y.Q. (author) / Huang, R. (author) / Song, J. (author) / Wang, X. (author) / Zhang, Y.X. (author) / Huang, Y.M.

    Published in:

    Optoelectronic Materials ; 1171-1174

    MATERIALS SCIENCE FORUM ; 663/665

    Publication date:

    2011-01-01

    Size:

    4 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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