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    Effect of Plasma Enhanced Chemical Vapor Deposition Parameters on Characteristics of Silicon nitride Film

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    New search for: Zhang, F.-h.

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    Effect of Plasma Enhanced Chemical Vapor Deposition Parameters on Characteristics of Silicon nitride Film

    New search for: Li, X.-b.
    New search for: Zhang, F.-h.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effect of Plasma Enhanced Chemical Vapor Deposition Parameters on Characteristics of Silicon nitride Film

    New search for: Li, X.-b.
    New search for: Zhang, F.-h.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Effect of Plasma Enhanced Chemical Vapor Deposition Parameters on Characteristics of Silicon nitride Film

    Contributors:

    Li, X.-b. (author) / Zhang, F.-h. (author)

    Published in:

    MATERIALS PROTECTION -WUHAN- ; 39 ; 12-16

    Publication date:

    2006-01-01

    Size:

    5 pages

    ISSN:

    1001-1560

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  620.1

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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