A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
Plasma etching of magnetic multilayers - effect of concurrent UV illumination
Plasma etching of magnetic multilayers - effect of concurrent UV illumination
Plasma etching of magnetic multilayers - effect of concurrent UV illumination
Cho, H. (author) / Lee, K.P. (author) / Hahn, Y.B. (author) / Lambers, E.S. (author) / Pearton, S.J. (author)
MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 67 ; 145 - 151
1999-01-01
7 pages
Article (Journal)
English
DDC:
620.11
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