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Optimisation of doped microcrystalline silicon films deposited at very low temperatures by hot-wire CVD
Optimisation of doped microcrystalline silicon films deposited at very low temperatures by hot-wire CVD
Optimisation of doped microcrystalline silicon films deposited at very low temperatures by hot-wire CVD
Voz, C. (Autor:in) / Peiro, D. (Autor:in) / Bertomeu, J. (Autor:in) / Soler, D. (Autor:in) / Fonrodona, M. (Autor:in) / Andreu, J. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 69-70 ; 278 - 283
01.01.2000
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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