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Microcrystalline silicon deposited by the hot-wire CVD technique

Guillet, J. / Niikura, C. / Bouree, J.E. / Kleider, J.P. / Longeaud, C. / Bruggemann, R.

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Microcrystalline silicon deposited by the hot-wire CVD technique

Guillet, J. / Niikura, C. / Bouree, J.E. / Kleider, J.P. / Longeaud, C. / Bruggemann, R.

Microcrystalline silicon deposited by the hot-wire CVD technique

Guillet, J. / Niikura, C. / Bouree, J.E. / Kleider, J.P. / Longeaud, C. / Bruggemann, R.

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Check availability in my library

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Document information

Title:

Microcrystalline silicon deposited by the hot-wire CVD technique

Contributors:

Guillet, J. (author) / Niikura, C. (author) / Bouree, J.E. (author) / Kleider, J.P. (author) / Longeaud, C. (author) / Bruggemann, R. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 69-70 ; 284 - 288

Publication date:

2000-01-01

Size:

5 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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