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Ellipsometry and microscopy study of nanocrystalline Si:H layers formed by high dose implantation of silicon
Ellipsometry and microscopy study of nanocrystalline Si:H layers formed by high dose implantation of silicon
Ellipsometry and microscopy study of nanocrystalline Si:H layers formed by high dose implantation of silicon
Popov, V. P. (author) / Antonova, I. V. (author) / Gutakovsky, A. K. (author) / Spesivtsev, E. V. (author) / Morosov, I. I. (author)
MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 73 ; 120 - 123
2000-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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