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    On the mechanism of chemical vapor deposition of Ta2O5 from TaCl5 and H2O. An ab initio study of gas phase reactions

    New search for: Siodmiak, M.
    New search for: Frenking, G.
    New search for: Korkin, A.

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    On the mechanism of chemical vapor deposition of Ta2O5 from TaCl5 and H2O. An ab initio study of gas phase reactions

    New search for: Siodmiak, M.
    New search for: Frenking, G.
    New search for: Korkin, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    On the mechanism of chemical vapor deposition of Ta2O5 from TaCl5 and H2O. An ab initio study of gas phase reactions

    New search for: Siodmiak, M.
    New search for: Frenking, G.
    New search for: Korkin, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Document information
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    Document information
    Title:

    On the mechanism of chemical vapor deposition of Ta2O5 from TaCl5 and H2O. An ab initio study of gas phase reactions

    Contributors:

    Siodmiak, M. (author) / Frenking, G. (author) / Korkin, A. (author)

    Published in:

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 3 ; 65-70

    Publication date:

    2000-01-01

    Size:

    6 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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