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    Gas phase reactions diagnosed by mass analysis in photo-assisted chemical vapor deposition of silicon nitride

    New search for: Yoshimoto, M.
    New search for: Takubo, K.
    New search for: Komoda, M.
    New search for: Matsunami, H.

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    Gas phase reactions diagnosed by mass analysis in photo-assisted chemical vapor deposition of silicon nitride

    New search for: Yoshimoto, M.
    New search for: Takubo, K.
    New search for: Komoda, M.
    New search for: Matsunami, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Gas phase reactions diagnosed by mass analysis in photo-assisted chemical vapor deposition of silicon nitride

    New search for: Yoshimoto, M.
    New search for: Takubo, K.
    New search for: Komoda, M.
    New search for: Matsunami, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
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    Document information
    Title:

    Gas phase reactions diagnosed by mass analysis in photo-assisted chemical vapor deposition of silicon nitride

    Contributors:

    Yoshimoto, M. (author) / Takubo, K. (author) / Komoda, M. (author) / Matsunami, H. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 79/80 ; 264

    Publication date:

    1994-01-01

    Size:

    264 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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