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    Electron beam lithography: resolution limits and applications

    New search for: Vieu, C.
    New search for: Carcenac, F.
    New search for: Pepin, A.
    New search for: Chen, Y.
    New search for: Mejias, M.
    New search for: Lebib, A.
    New search for: Manin-Ferlazzo, L.
    New search for: Couraud, L.
    New search for: Launois, H.

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    Electron beam lithography: resolution limits and applications

    New search for: Vieu, C.
    New search for: Carcenac, F.
    New search for: Pepin, A.
    New search for: Chen, Y.
    New search for: Mejias, M.
    New search for: Lebib, A.
    New search for: Manin-Ferlazzo, L.
    New search for: Couraud, L.
    New search for: Launois, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Electron beam lithography: resolution limits and applications

    New search for: Vieu, C.
    New search for: Carcenac, F.
    New search for: Pepin, A.
    New search for: Chen, Y.
    New search for: Mejias, M.
    New search for: Lebib, A.
    New search for: Manin-Ferlazzo, L.
    New search for: Couraud, L.
    New search for: Launois, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Electron beam lithography: resolution limits and applications

    Contributors:

    Vieu, C. (author) / Carcenac, F. (author) / Pepin, A. (author) / Chen, Y. (author) / Mejias, M. (author) / Lebib, A. (author) / Manin-Ferlazzo, L. (author) / Couraud, L. (author) / Launois, H. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 164 ; 111-117

    Publication date:

    2000-01-01

    Size:

    7 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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