Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Electron beam lithography: resolution limits and applications
Electron beam lithography: resolution limits and applications
Electron beam lithography: resolution limits and applications
Vieu, C. (Autor:in) / Carcenac, F. (Autor:in) / Pepin, A. (Autor:in) / Chen, Y. (Autor:in) / Mejias, M. (Autor:in) / Lebib, A. (Autor:in) / Manin-Ferlazzo, L. (Autor:in) / Couraud, L. (Autor:in) / Launois, H. (Autor:in)
APPLIED SURFACE SCIENCE ; 164 ; 111-117
01.01.2000
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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