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Atomic layer deposition of Al2O3 and SiO2 on BN particles using sequential surface reactions

Ferguson, J. D. / Weimer, A. W. / George, S. M.

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Atomic layer deposition of Al2O3 and SiO2 on BN particles using sequential surface reactions

Ferguson, J. D. / Weimer, A. W. / George, S. M.

Atomic layer deposition of Al2O3 and SiO2 on BN particles using sequential surface reactions

Ferguson, J. D. / Weimer, A. W. / George, S. M.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Atomic layer deposition of Al2O3 and SiO2 on BN particles using sequential surface reactions

Contributors:

Ferguson, J. D. (author) / Weimer, A. W. (author) / George, S. M. (author)

Published in:

APPLIED SURFACE SCIENCE ; 162/163 ; 280-292

Publication date:

2000-01-01

Size:

13 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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