Si-TiO2 interface evolution at prolonged annealing in low vacuum or N2O ambient: Fid-Bau Portal

Si-TiO2 interface evolution at prolonged annealing in low vacuum or N2O ambient

Erkov, V. G. / Devyatova, S. F. / Molodstova, E. L. / Malsteva, T. V. / Yanovskii, U. A.

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Si-TiO2 interface evolution at prolonged annealing in low vacuum or N2O ambient

Erkov, V. G. / Devyatova, S. F. / Molodstova, E. L. / Malsteva, T. V. / Yanovskii, U. A.

Si-TiO2 interface evolution at prolonged annealing in low vacuum or N2O ambient

Erkov, V. G. / Devyatova, S. F. / Molodstova, E. L. / Malsteva, T. V. / Yanovskii, U. A.

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Document information

Title:

Si-TiO2 interface evolution at prolonged annealing in low vacuum or N2O ambient

Contributors:

Erkov, V. G. (author) / Devyatova, S. F. (author) / Molodstova, E. L. (author) / Malsteva, T. V. (author) / Yanovskii, U. A. (author)

Published in:

APPLIED SURFACE SCIENCE ; 166 ; 51-56

Publication date:

2000-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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