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    Properties of Reactive Magnetron Sputtered ITO Films without in-situ Substrate Heating and Post-deposition Annealing

    New search for: Chen, M.
    New search for: Bai, X.
    New search for: Gong, J.
    New search for: Sun, C.
    New search for: Huang, R.
    New search for: Wen, L.

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    Properties of Reactive Magnetron Sputtered ITO Films without in-situ Substrate Heating and Post-deposition Annealing

    New search for: Chen, M.
    New search for: Bai, X.
    New search for: Gong, J.
    New search for: Sun, C.
    New search for: Huang, R.
    New search for: Wen, L.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Properties of Reactive Magnetron Sputtered ITO Films without in-situ Substrate Heating and Post-deposition Annealing

    New search for: Chen, M.
    New search for: Bai, X.
    New search for: Gong, J.
    New search for: Sun, C.
    New search for: Huang, R.
    New search for: Wen, L.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Properties of Reactive Magnetron Sputtered ITO Films without in-situ Substrate Heating and Post-deposition Annealing

    Contributors:

    Chen, M. (author) / Bai, X. (author) / Gong, J. (author) / Sun, C. (author) / Huang, R. (author) / Wen, L. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE AND TECHNOLOGY -SHENYANG- ; 16 ; 281-285

    Publication date:

    2000-01-01

    Size:

    5 pages

    ISSN:

    1005-0302

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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