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On the structure and composition of crystalline carbon nitride films synthesized by microwave plasma chemical vapor deposition

Zhang, Y. P. / Gu, Y. S. / Chang, X. R. / Tian, Z. Z. / Shi, D. X. / Zhang, X. F.

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On the structure and composition of crystalline carbon nitride films synthesized by microwave plasma chemical vapor deposition

Zhang, Y. P. / Gu, Y. S. / Chang, X. R. / Tian, Z. Z. / Shi, D. X. / Zhang, X. F.

On the structure and composition of crystalline carbon nitride films synthesized by microwave plasma chemical vapor deposition

Zhang, Y. P. / Gu, Y. S. / Chang, X. R. / Tian, Z. Z. / Shi, D. X. / Zhang, X. F.

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Check availability in my library

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Document information

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Document information

Title:

On the structure and composition of crystalline carbon nitride films synthesized by microwave plasma chemical vapor deposition

Contributors:

Zhang, Y. P. (author) / Gu, Y. S. (author) / Chang, X. R. (author) / Tian, Z. Z. (author) / Shi, D. X. (author) / Zhang, X. F. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 78 ; 11 - 15

Publication date:

2000-01-01

Size:

5 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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Effect of silicon impurity on carbon nitride films prepared by microwave plasma chemical vapor deposition

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Deposition and characterization of carbon nitride films from hexamethylenetetramine/N2 by microwave plasma-enhanced chemical vapor deposition

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