Deposition and characterization of carbon nitride films from hexamethylenetetramine/N2 by microwave plasma-enhanced chemical vapor deposition: Fid-Bau Portal

Deposition and characterization of carbon nitride films from hexamethylenetetramine/N2 by microwave plasma-enhanced chemical vapor deposition

Uddin, M. N. / Fouad, O. A. / Yamazato, M. / Nagano, M.

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Deposition and characterization of carbon nitride films from hexamethylenetetramine/N2 by microwave plasma-enhanced chemical vapor deposition

Uddin, M. N. / Fouad, O. A. / Yamazato, M. / Nagano, M.

Deposition and characterization of carbon nitride films from hexamethylenetetramine/N2 by microwave plasma-enhanced chemical vapor deposition

Uddin, M. N. / Fouad, O. A. / Yamazato, M. / Nagano, M.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Deposition and characterization of carbon nitride films from hexamethylenetetramine/N2 by microwave plasma-enhanced chemical vapor deposition

Contributors:

Uddin, M. N. (author) / Fouad, O. A. (author) / Yamazato, M. (author) / Nagano, M. (author)

Published in:

APPLIED SURFACE SCIENCE ; 240 ; 120-130

Publication date:

2005-01-01

Size:

11 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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