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Effect of silicon impurity on carbon nitride films prepared by microwave plasma chemical vapor deposition
Effect of silicon impurity on carbon nitride films prepared by microwave plasma chemical vapor deposition
Effect of silicon impurity on carbon nitride films prepared by microwave plasma chemical vapor deposition
Zhang, Y. P. (author) / Gu, Y. S. (author)
MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 85 ; 38 - 42
2001-01-01
5 pages
Article (Journal)
English
DDC:
620.11
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