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The use of convergent beam electron diffraction for stress measurements in shallow trench isolation structures

Stuer, C. / Van Landuyt, J. / Bender, H. / Rooyackers, R. / Badenes, G.

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The use of convergent beam electron diffraction for stress measurements in shallow trench isolation structures

Stuer, C. / Van Landuyt, J. / Bender, H. / Rooyackers, R. / Badenes, G.

The use of convergent beam electron diffraction for stress measurements in shallow trench isolation structures

Stuer, C. / Van Landuyt, J. / Bender, H. / Rooyackers, R. / Badenes, G.

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Order at Subito €

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Document information

Title:

The use of convergent beam electron diffraction for stress measurements in shallow trench isolation structures

Contributors:

Stuer, C. (author) / Van Landuyt, J. (author) / Bender, H. (author) / Rooyackers, R. (author) / Badenes, G. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 4 ; 117-119

Publication date:

2001-01-01

Size:

3 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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