Strain characterisation of shallow trench isolation structures on a nanometer scale by convergent beam electron diffraction: Fid-Bau Portal

Strain characterisation of shallow trench isolation structures on a nanometer scale by convergent beam electron diffraction

Armigliato, A. / Balboni, R. / Frabboni, S. / Benedetti, A. / Cullis, A. G. / Carnevale, G. P. / Colpani, P. / Pavia, G.

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Strain characterisation of shallow trench isolation structures on a nanometer scale by convergent beam electron diffraction

Armigliato, A. / Balboni, R. / Frabboni, S. / Benedetti, A. / Cullis, A. G. / Carnevale, G. P. / Colpani, P. / Pavia, G.

Strain characterisation of shallow trench isolation structures on a nanometer scale by convergent beam electron diffraction

Armigliato, A. / Balboni, R. / Frabboni, S. / Benedetti, A. / Cullis, A. G. / Carnevale, G. P. / Colpani, P. / Pavia, G.

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Title:

Strain characterisation of shallow trench isolation structures on a nanometer scale by convergent beam electron diffraction

Contributors:

Armigliato, A. (author) / Balboni, R. (author) / Frabboni, S. (author) / Benedetti, A. (author) / Cullis, A. G. (author) / Carnevale, G. P. (author) / Colpani, P. (author) / Pavia, G. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 4 ; 97-99

Publication date:

2001-01-01

Size:

3 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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