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    Growth of tin nitride thin films by atmospheric pressure chemical vapor deposition using a halide source

    New search for: Takahashi, N.
    New search for: Terada, K.
    New search for: Nakamura, T.

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    Growth of tin nitride thin films by atmospheric pressure chemical vapor deposition using a halide source

    New search for: Takahashi, N.
    New search for: Terada, K.
    New search for: Nakamura, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Growth of tin nitride thin films by atmospheric pressure chemical vapor deposition using a halide source

    New search for: Takahashi, N.
    New search for: Terada, K.
    New search for: Nakamura, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
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    Document information
    Title:

    Growth of tin nitride thin films by atmospheric pressure chemical vapor deposition using a halide source

    Contributors:

    Takahashi, N. (author) / Terada, K. (author) / Nakamura, T. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE LETTERS ; 20 ; 227-228

    Publication date:

    2001-01-01

    Size:

    2 pages

    ISSN:

    0261-8028

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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