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    The dependence of the etching property of CoSi2 films in diluted HF solutions on the formation conditions

    New search for: Zhu, S.
    New search for: Ru, G.
    New search for: Detavernier, C.
    New search for: Van Meirhaeghe, R. L.
    New search for: Cardon, F.
    New search for: Li, B.

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    The dependence of the etching property of CoSi2 films in diluted HF solutions on the formation conditions

    New search for: Zhu, S.
    New search for: Ru, G.
    New search for: Detavernier, C.
    New search for: Van Meirhaeghe, R. L.
    New search for: Cardon, F.
    New search for: Li, B.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    The dependence of the etching property of CoSi2 films in diluted HF solutions on the formation conditions

    New search for: Zhu, S.
    New search for: Ru, G.
    New search for: Detavernier, C.
    New search for: Van Meirhaeghe, R. L.
    New search for: Cardon, F.
    New search for: Li, B.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    The dependence of the etching property of CoSi2 films in diluted HF solutions on the formation conditions

    Contributors:

    Zhu, S. (author) / Ru, G. (author) / Detavernier, C. (author) / Van Meirhaeghe, R. L. (author) / Cardon, F. (author) / Li, B. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 178 ; 44-49

    Publication date:

    2001-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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